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H. Shirai, Y. Fujimura and S. jung, “Formation of Nanocrystalline Silicon Dots from Chlorinated Materials by RF Plasma-Enhanced Chemical Vapor Deposition,” Thin Solid Films, Vol. 407, No. 1-2, 2002, pp. 12-17. doi:10.1016/S0040-6090(02)00005-6

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