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Optical Methods in Orientation of High-Purity Germanium Crystal

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DOI: 10.4236/jcpt.2013.32009    4,120 Downloads   6,248 Views   Citations

ABSTRACT

Two optical methods, namely crystal facet reflection and etching pits reflection, were used to orient <100> and <111> high-purity germanium crystals. The X-ray diffraction patterns of three slices that were cut from the oriented <100> and <111> crystals were measured by X-ray diffraction. The experimental errors of crystal facet reflection method and etching pits reflection method are in the range of 0.05° - 0.12°. The crystal facet reflection method and etching pits reflection method are extremely simple and cheap and their accuracies are acceptable for characterizing high purity detector-grade germanium crystals.

Conflicts of Interest

The authors declare no conflicts of interest.

Cite this paper

G. Wang, Y. Sun, Y. Guan, D. Mei, G. Yang, A. Chiller and B. Gray, "Optical Methods in Orientation of High-Purity Germanium Crystal," Journal of Crystallization Process and Technology, Vol. 3 No. 2, 2013, pp. 60-63. doi: 10.4236/jcpt.2013.32009.

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