Optical Methods in Orientation of High-Purity Germanium Crystal

Abstract

Two optical methods, namely crystal facet reflection and etching pits reflection, were used to orient <100> and <111> high-purity germanium crystals. The X-ray diffraction patterns of three slices that were cut from the oriented <100> and <111> crystals were measured by X-ray diffraction. The experimental errors of crystal facet reflection method and etching pits reflection method are in the range of 0.05° - 0.12°. The crystal facet reflection method and etching pits reflection method are extremely simple and cheap and their accuracies are acceptable for characterizing high purity detector-grade germanium crystals.

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G. Wang, Y. Sun, Y. Guan, D. Mei, G. Yang, A. Chiller and B. Gray, "Optical Methods in Orientation of High-Purity Germanium Crystal," Journal of Crystallization Process and Technology, Vol. 3 No. 2, 2013, pp. 60-63. doi: 10.4236/jcpt.2013.32009.

Conflicts of Interest

The authors declare no conflicts of interest.

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