TITLE:
Quartz Crystal Microbalances for Evaluating Gas Motion Differences between Dichlorosilane and Trichlorosilane in Ambient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor
AUTHORS:
Mana Otani, Toshinori Takahashi, Hitoshi Habuka, Yuuki Ishida, Shin-Ichi Ikeda, Shiro Hara
KEYWORDS:
Minimal Fab, Chemical Vapor Deposition Reactor, Quartz Crystal Microbalance, Silicon Epitaxial Growth, Trichlorosilane, Dichlorosilane
JOURNAL NAME:
Advances in Chemical Engineering and Science,
Vol.10 No.3,
June
30,
2020
ABSTRACT: A dichlorosilane gas and a
trichlorosilane gas in ambient hydrogen were evaluated to show their different
gas flow motions in a slim vertical cold wall chemical vapor deposition reactor
for the Minimal Fab system. This evaluation was performed for improving and
controlling the film qualities and the productivities, using two quartz crystal
microbalances (QCM) installed at the inlet
and exhaust of the chamber by taking into account that the QCM frequency
corresponds to the real time changes in the gas properties. Typically,
the time period approaching from the inlet to the exhaust was shorter for the
trichlorosilane gas than that for the dichlorosilane gas. The trichlorosilane
gas was shown to move like plug flow, while the dichlorosilane gas seemed to be
well mixed in the entire chamber.