R. Reshmi, M. K. Jayaraj and M. T. Sebastian, “Influence of Oxygen to Argon Ratio on the Properties of RF Magnetron Sputtered Ba0.7Sr0.3TiO3 Thin Films,” Journal of the Electrochemical Society, Vol. 158, No. 5, 2011, pp. G124-G127. doi:10.1149/1.3566094

has been cited by the following article:

• TITLE: Influence of Oxygen to Argon Ratio on the Structural and Morphological Properties of Nb-Doped SrTiO3 Epitaxial Films Grown by Reactive Ion Beam Sputter Deposition

  AUTHORS: Gasidit Panomsuwan, Nagahiro Saito

  KEYWORDS: Nb-Doped SrTiO3; Epitaxial Films; Crystal Structure; Ion Beam Sputter Deposition

  JOURNAL NAME: Crystal Structure Theory and Applications, Vol.2 No.1, March 29, 2013

  ABSTRACT: Nb-doped SrTiO3 (STNO) films were grown on (001)-oriented LaAlO3 substrates by a reactive ion beam sputter deposition at various mixing ratios (OMRs) with a substrate temperature of 800oC. The STNO films exhibited good crystallinity with an epitaxial orientation as characterized by high-resolution X-ray diffraction, grazing-incidence X-ray diffraction, and in-plane pole figure analysis. A decrease of out-of-plane and in-plane lattice constants was observed with an increase of OMR. The surface morphology of the STNO films showed a very dense fine-grain structure. The root-mean-square roughness was found to be increased as the OMR increased. Moreover, the elemental compositions of the STNO films were examined by X-ray photoelectron spectroscopy.