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https://doi.org/10.1016/S0257-8972(02)00635-7

has been cited by the following article:

• TITLE: Deposition and Characterization of Multilayer DLC/BN Films

  AUTHORS: Honei Chin, Chavin Jongwannasiri, Shuichi Watanabe

  KEYWORDS: DLC/BN, Multilayer, RF Sputtering

  JOURNAL NAME: Materials Sciences and Applications, Vol.8 No.10, September 14, 2017

  ABSTRACT: In this article, the results obtained from a study on multilayer diamond-like carbon and boron nitride (DLC/BN) films are reported. The microstructure, atomic concentration, hardness and friction coefficient of the films were characterized using transmission electron microscopy, auger electron microscopy, nano-indentation measurements and ball-on-disk friction testing. The effects of bilayer thickness and substrate bias on film growth were investigated. All multilayer films showed alternate DLC and BN layers, except the 2- and 4-nm bilayer of multilayer DLC/BN films deposited without substrate bias. Although the layers were very thin, each layer was distinguishable. This was confirmed by the use of TEM imaging and AES measurements. The hardness values of all the multilayer films were lower than those measured for the monolayer DLC and BN films. However, the hardness can be altered with a change in the bilayer thickness. Furthermore, in the case of the films deposited with substrate bias, multilayer DLC/BN films showed an improvement in wear resistance compared to monolayer DLC and BN films. Thus, the deposition of multilayer DLC/BN films can be considered to be beneficial in prolonging the service life of the surface.