Recent studies using BSIM3 models have suggested that noise depends on the transconductance-to-drain ratio g_m/I_D of a transistor. However, to the best of our knowledge, no experimental result demonstrating g_m/I_D dependent noise previously observed in simulation is available in the literature. This paper examines the underlying principles that make it possible to analyze noise using g_m/I_D based noise analysis. Qualitative discussion of normalized noise is presented along with experimental results from a 130 nm CMOS process. A close examination of the experimental results reveals that the device noise is width independent from 1 Hz to 10 kHz. Moreover, noise increases as g_m/I_D is reduced. The experiment observation that noise is width independent makes it possible for circuit designers to generate normalized parameters that are used to study noise intuitively and accurately.