Journal of Materials Science and Chemical Engineering

Volume 3, Issue 9 (September 2015)

ISSN Print: 2327-6045   ISSN Online: 2327-6053

Google-based Impact Factor: 0.93  Citations  

Preparation of CuO-Ta2O5 Composites Using a Simple Co-Sputtering Method

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DOI: 10.4236/msce.2015.39006    2,438 Downloads   2,813 Views  Citations


We prepared CuO-Ta2O5 composite films using our simple co-sputtering method for the first time. Four specimens were prepared from an as-deposited CuO-Ta2O5 sample by cutting it using a diamond- wire saw, and the specimens were subsequently annealed at 600°C - 900°C. The X-ray diffraction and photoluminescence (PL) of the annealed specimens were evaluated. The CuO-Ta2O5 film annealed at 600°C seemed to be primarily amorphous phase, and a sharp PL peak at a wavelength of 450 nm, due to the existence of Cu2+, was observed from the film. In contrast, the CuO-Ta2O5 films annealed at 700°C, 800°C, and 900°C seemed to be tetragonal CuTa2O6 phases. We expect that good-quality CuTa2O6 films can be obtained using our very simple co-sputtering method and subsequent annealing above 900°C. Such CuTa2O6 films can be used in chemisorptions conductometric gas sensors.

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Miura, K. , Osawa, T. , Yokota, Y. , Hossain, Z. and Hanaizumi, O. (2015) Preparation of CuO-Ta2O5 Composites Using a Simple Co-Sputtering Method. Journal of Materials Science and Chemical Engineering, 3, 47-51. doi: 10.4236/msce.2015.39006.

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