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The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems

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DOI: 10.4236/opj.2013.31017    3,082 Downloads   5,203 Views   Citations

ABSTRACT

The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.

Conflicts of Interest

The authors declare no conflicts of interest.

Cite this paper

S. Odinokov and H. Sagatelyan, "The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems," Optics and Photonics Journal, Vol. 3 No. 1, 2013, pp. 102-111. doi: 10.4236/opj.2013.31017.

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