M. Mao, Y. N. Wang and A. Bogaerts, “Numerical Study of the Plasma Chemistry in Inductively Coupled SF6 and SF6/Ar Plasma Used for Deep Silicon Etching Applications,” Journal of Physics D: Applied Physics, Vol. 44, No. 43, 2011, Article ID: 435202. doi:10.1088/0022-3727/44/43/435202

has been cited by the following article:

• TITLE: The Design and Manufacturing of Diffraction Optical Elements to form a Dot-Composed Etalon Image within the Optical Systems

  AUTHORS: Sergey Borisovich Odinokov, Hike Rafaelovich Sagatelyan

  KEYWORDS: Optical Glass; Plasma-Chemical Etching; Selectivity; Diffraction Gratings; Micro-Optics

  JOURNAL NAME: Optics and Photonics Journal, Vol.3 No.1, March 26, 2013

  ABSTRACT: The possibilities of manufacturing of diffraction optical elements (DOE), using the “Caroline 15 PE” plasma-etching machine were considered. It is established that at thickness of chromic mask of 100 nm the plasma-chemical etching (PCE) method reaches depth of surface micro-profile to 1.4 μm on optical glass. It allows increasing the diffraction efficiency of DOE to 0.3 - 0.35 on the second order of diffraction.