M. F. Schubert, F. W. Mont, S. Chhajed, D. J. Poxson, J. K. Kim and E. Fred Schubert, “Design of Multilayer Antireflection Coatings Made from Co-Sputtered and Low-Refractive-Index Materials by Genetic Algorithm,” Optics Express, Vol. 16, No. 8, 2008, pp. 5290-5298.doi:10.1364/OE.16.005290

has been cited by the following article:

• TITLE: Development of Nanostructured Antireflection Coatings for EO/IR Sensor and Solar Cell Applications

  AUTHORS: Ashok K. Sood, Adam W. Sood, Roger E. Welser, Gopal G. Pethuraja, Yash R. Puri, Xing Yan, David J. Poxson, Jaehee Cho, E. Fred Schubert, Nibir K. Dhar, Dennis L. Polla, Pradeep Haldar, Jennifer L. Harvey

  KEYWORDS: Antireflection Coating; Nanostructured Layer; Oblique Angle Deposition; Silicon Dioxide; Broadband; Omni-Directional

  JOURNAL NAME: Materials Sciences and Applications, Vol.3 No.9, September 27, 2012

  ABSTRACT: Electro-optical/infrared (EO/IR) sensors and photovoltaic power sources are being developed for a variety of defense and commercial applications. One of the critical technologies that will enhance both EO/IR sensor and photovoltaic module performance is the development of high quality nanostructure-based antireflection coatings. In this paper, we review our work on advanced antireflection structures that have been designed by using a genetic algorithm and fabricated by using oblique angle deposition. The antireflection coatings are designed for the wavelength range of 250 nm to 2500 nm and an incidence angle between 00 and 400. These nanostructured antireflection coatings are shown to enhance the optical transmission through transparent windows over a wide band of interest and minimize broadband reflection losses to less than one percent, a substantial improvement over conventional thin-film antireflection coating technologies.