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Anthony, C.J. (1998) MOCVD of Electroceramic Oxides: A Precursor Manufacturer’s Perspective. Chemical Vapor Deposition, 4, 169-179.
http://dx.doi.org/10.1002/(SICI)1521-3862(199810)04:05<169::AID-CVDE169>3.3.CO;2-Y

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