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Kim, Y.C., Park, H.H., Chun, J.S. and Lee, W.J. (1994) Compositional and Structural Analysis of Aluminum Oxide Films Prepared by Plasma-Enhanced Chemical Vapor Deposition. Thin Solid Films, 237, 57-65.
http://dx.doi.org/10.1016/0040-6090(94)90238-0

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