W. K. Bischel, L. J. Jusinski, M. N. Spencer and D. J. Eckstrom, “Absolute Two-Photon Ionization Yields for Selected Organic Molecules at 248 nm,” Journal of the Optical Society of America B, Vol. 2, No. 6, 1985, pp. 877 885. http://dx.doi.org/10.1364/JOSAB.2.000877

has been cited by the following article:

• TITLE: Model for a UV Laser Based Local Polymer Surface Halogenation Process Using a Gaseous Precursor

  AUTHORS: Simon Kibben

  KEYWORDS: Local Surface Halogenation; Polymer Modification; UV-Laser-Based Surface Modification

  JOURNAL NAME: Modeling and Numerical Simulation of Material Science, Vol.4 No.1, January 7, 2014

  ABSTRACT: An analytical model describing the physical relations of a UV-based process for halogenation of polymeric surfaces is presented. The process allows, depending on the parameters, a local halogenation with sharp edges at the interfaces to areas where no halogenation is desired. This is achieved via a nonreactive halogen-containing gaseous precursor and a UV source providing photons which dissociate the precursor photolytically. Thus, only where the UV photons affect the precursor, halogens are generated and the polymer is being halogenated.