Weissbuch, I., Baxter, P.N.W., Cohen, S., Cohen, H., Kjaer, K., Howes, P.B., Als-Nielsen, J., Hanan, G.S., Schubert, U.S., Lehn, J.-M., Leiserowitz, L. and Lahav, M.J. (1998) Self-Assembly at the Air-Water Interface. In-Situ Preparation of Thin Films of Metal Ion Grid Architectures. Journal of the American Chemistry Society, 120, 4850-4860.
https://doi.org/10.1021/ja980205w

has been cited by the following article:

• TITLE: Stability Behaviour of Monolayer Tetraether Lipids on the Amino-Silanised Silicon Wafer: Comparative Study between Langmuir-Blodgett Monolayers with Self-Assembled Monolayers

  AUTHORS: Sri Vidawati, Udo Bakowsky, Urich Rothe

  KEYWORDS: Caldarchaeol-PO4, Langmuir-Blodgett Films, Self Assembling Monolayers (SAMs), Amino-Silanised Silicon Wafer

  JOURNAL NAME: Advances in Materials Physics and Chemistry, Vol.10 No.11, November 25, 2020

  ABSTRACT: This study investigated the stability behaviour of molecular monolayer symmetric chemically modified tetraether lipids caldarchaeol-PO4 on the amino-silanised silicon wafer using Langmuir-Blodgett films, Self Assembling Monolayers (SAMs), ellipsometry, and atomic force microscopy (AFM). The monolayers of caldarchaeol-PO4 were stable on the solid surface amino-silanised silicon wafer. The organizations of molecular monolayers caldarchaeol-PO4 by Langmuir-Blodgett method and SAMs have been analyzed. The surface of pressure in Langmuir-Blodgett processing is carried out monolayers caldarchaeol-PO4 more flat island inhomogeneous. Another method of monolayers caldarchaeol-PO4 by SAMs is showed a large flat domain. Monolayers caldarchaeol-PO4 by Langmuir-Blodgett method seems to be stable and chemically resistant after washing with organic solvent and an additional treatment ultrasonification with various thickness lipids arround 2 nm to 6 nm. Conversely, monolayer caldarchaeol-PO4 by SAMs appears fewer than monolayers caldarchaeol-PO4 by Langmuir-Blodgett method, the thickness of various from 1 nm to 3 nm.