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Arimoto, K., Watanabe, M., Yamanaka, J., Nakagawa, K., Usami, N., Nakajima, K., Sawano, K. and Shiraki, Y. (2009) Strain Relaxation Mechanisms in Step-Graded Si-Ge/Si(110) Hetero-Structures Grown by Gas-Source MBE at High Temperatures. J. Cryst. Growth, 311, 819-824. https://doi.org/10.1016/j.jcrysgro.2008.09.064

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