Article citationsMore>>

S. F. Szymanski, M. T. Seman and C. A. Wolden, “Plasma and Gas-Phase Characterization of a Pulsed Plasma-Enhanced Chemical Vapor Deposition System Engineered for Self-Limiting Growth of Aluminum Oxide Thin Films,” Surface and Coatings Technology, Vol. 201, 2007, pp. 8991-8997.

has been cited by the following article:

Follow SCIRP
Twitter Facebook Linkedin Weibo
Contact us
WhatsApp +86 18163351462(WhatsApp)
Click here to send a message to me 1655362766
Paper Publishing WeChat
Free SCIRP Newsletters
Copyright © 2006-2023 Scientific Research Publishing Inc. All Rights Reserved.