TITLE:
Impact Thickness on Structural and Electrical Characterization of Nickel Phthalocyanine Thin Films
AUTHORS:
Eman M. Nasir, Mohammed T. Hussein, Addnan H. Al-Aarajiy
KEYWORDS:
Nickel Phthalocyanine, Vacuum Evaporation, XRD, AFM, Morphology, Thin Film, Electrical Properties
JOURNAL NAME:
Advances in Materials Physics and Chemistry,
Vol.9 No.7,
July
31,
2019
ABSTRACT: Thin films of Nickel Phthalocyanine have been
prepared by evaporation technique for (50 - 350 nm) of thickness. XRD studies show that the thin films have single
crystalline structure for low thicknesses with (100) orientation and the
crystallite size increased with increased thickness. Also from the AFM
technique for NiPc films, the roughness was determined
and the grain size increases with increasing of thickness from except at
thickness 350 nm. The studies of electrical properties, morphology and
orientations of the crystallites are important to understand and predict the
nature of the films and essential for their successful applications in solar
cell and sensors. The electrical properties of these films were studied with
different thickness, NiPc has three activation energy. Carrier’s concentration and mobility was calculated. Hall measurements showed
that all the films are p-type.