Texture ZnO Thin-Films and their Application as Front Electrode in Solar Cells

DOI: 10.4236/eng.2010.212124   PDF   HTML     7,722 Downloads   14,073 Views   Citations


In this paper, three kinds of textured ZnO thin-films (the first kind has the textured structure with both columnar and polygon, the second posses pyramid-like textured structure only, and the third has the textured structure with both crater-like and pyramid-like), were prepared by three kinds of methods, and the application of these ZnO thin-films as a front electrode in solar cell was studied, respectively. In the first method with negative bias voltage and appropriate sputtering parameters, the textured structure with columnar and polygon on the surface of ZnO thin-film are both existence for the sample prepared by direct magnetron sputtering. Using as a front electrode in solar cell, the photoelectric conversion efficiency Eff of 7.00% was obtained. The second method is that by sputtering on the ZnO:Al self-supporting substrate, and the distribution of pyramid-like was gained. Moreover, the higher (8.25%) photoelectric conversion efficiency of solar cell was got. The last method is that by acid-etching the as-deposited ZnO thin-film which possesses mainly both columnar and polygon structure, and the textured ZnO thin-film with both crater-like and pyramid-like structure was obtained, and the photoelectric conversion efficiency of solar cell is 7.10% when using it as front electrode. These results show that the textured ZnO thin-film prepared on self-supporting substrate is more suitable for using as a front electrode in amorphous silicon cells.

Share and Cite:

Y. Hu, Y. Chen, H. Xu, H. Gao, W. Jiang, F. Hu and Y. Wang, "Texture ZnO Thin-Films and their Application as Front Electrode in Solar Cells," Engineering, Vol. 2 No. 12, 2010, pp. 973-978. doi: 10.4236/eng.2010.212124.

Conflicts of Interest

The authors declare no conflicts of interest.


[1] N. Taneda, T. Oyama and K. Sato, “Light Scattering Effects of Highly Textured Transparent Conductive Oxides Films,” Pro-ceedings of International PVSEC-17 Conference, Fukuoka, 3-7 December 2007, pp. 309-313.
[2] R. Bartl, R. Schlatmann, B. Stannowski, A. Gordijn, M. N. van den Donker, F. Finger and B. Rech, “TCO development for thin film silicon solar cells,” Proceedings of the 21st European Photovoltaic Solar Energy Conference and Exhibition, Dresden, 4-8 September 2006, pp. 1666-1671.
[3] Y. H. Hu, Y. J. Xie, M. H. Qu, L. F. Wang and H. J. Xu, “Studying on the Preparation and Characteristics of Al2O3-Based Textured ZnO Thin Films,” Symp. Photonics Optoelectron., SOPO- Proc., Chengdu, 19-21 June 2010, pp. 1-4.
[4] M. Berginski, J. Hüpkes, W. Reetz, B. Rech and M. Wuttig, “Recent Development on Surface-Textured ZnO:Al Films Prepared by Sputtering for Thin-Film Solar Cell Appli-cation,” Thin Solid Films, Vol. 516, No. 17, 2008, pp. 5836-5841.
[5] R. Groenen, J. L. Linden and H. R. M. van Lierop, “An Expanding Thermal Plasma for Deposition of Sur-face Textured ZnO:Al with Focus on Thin Film Solar Cell Ap-plications,” Applied Surface Science, Vol. 173, No. 1-2, 2001, pp. 40-43.
[6] R. E. I. Schropp, H. Li and R. H. J. Franken, “Nanostructured Thin Films for Multiband Gap Silicon Triple Junction Solar Cells,” Solar Energy Materials and Solar Cells, Vol. 93, No. 6-7, 2009, pp. 1129-1133.
[7] V. Sittinger and F. Ruske, “ZnO:Al Films Deposited by in-Line Reactive AC Magnetron Sputtering for a-Si:H Thin Film Solar Cells,” Thin Solid Films, Vol. 496, No. 1, 2006, pp. 16-25.
[8] C. Agashe, O. Kluth and J. Hüpkes, “Efforts to Improve Carrier Mobility in Radio Frequency Sputtered Aluminum Doped Zinc Oxide Films,” Journal of Applied Physics, Vol. 95, No. 4, 2004, pp. 1911-1917.
[9] J. C. Lin, K. C. Peng, C. A. Tseng and S. L. Lee, “Deposition of Al-doped and Al, Scco-doped Zinc Oxide Films by RF- and DC-Sputtering of the ZnO and Al-xSc (x=0, 0.4, 0.8 and 1.7 wt.%) Targets,” Surface & Coatings Technology, Vol. 202, No. 22-23, 2008, pp. 5480-5483.
[10] Y. H. Hu, L. F. Wang, H. J. Xu, Y. C. Chen and W. H. Jiang, “The Low-Cost Preparation of Pyramid-Like Texture ZnO Thin Films and the Application as a Front Electrode in Hydrogen Amorphous Silicon Solar Cells,” Proceedings of SPIE, Vol. 7658, 2010, p. (76580D)1.
[11] Z. W. Yang, S. H. Han, T. L. Yang, J. Q. Zhao, J. Ma and H. L. Ma, “Preparation of ITO Films on Water-Cooled Flexible Substrate by Bias R.F. Magnetron Sputtering,” Acta Physica Sinica, Vol. 49, No. 6, 2000, pp. 1196-1201.
[12] X. L. Chen, J. M. Xue and J. Sun, “Effect of Film Thickness on the ZnO Thin Film as TCO Grown by MOCVD Technique,” Journal of Synthetic Crystals, Vol. 35, No. 6, 2006, pp. 1313-1319.

comments powered by Disqus

Copyright © 2020 by authors and Scientific Research Publishing Inc.

Creative Commons License

This work and the related PDF file are licensed under a Creative Commons Attribution 4.0 International License.