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[1]
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Electron-beam annealing of Josephson junctions for frequency tuning of quantum processors
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arXiv preprint arXiv …,
2024 |
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[2]
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Molecular and Atomic Layer Deposition of Hybrid Inorganic-Organic Materials–Deposition on Porous Substrates
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2024 |
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[3]
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Multilayer thin films of aluminum oxide and tantalum oxide deposited by pulsed direct current magnetron sputtering for dielectric applications
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Vacuum,
2023 |
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[4]
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High-quality AlN epilayers prepared by atomic layer deposition and large-area rapid electron beam annealing
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Materials Chemistry and …,
2023 |
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[5]
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The effect of the surface morphology of the aluminium oxide layer on the physical and bacterial attachment behavior
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Surface Topography: Metrology and …,
2023 |
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[6]
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Effect of Co-fed Water on a Co–Pt–Si/γ-Al2O3 Fischer–Tropsch Catalyst Modified with an Atomic Layer Deposited or Molecular Layer Deposition Overcoating
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ACS …,
2022 |
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[7]
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Samarium-decorated ZrO2@ SnO2 nanostructures, their electrical, optical and enhanced photoluminescence properties
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Journal of Materials …,
2022 |
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[8]
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Plasma Oxidized AlOx Tunnel Barriers and Nb/Al Bilayers Examined by Electrical Transport
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2022 |
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[9]
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Curing defects in plasma-enhanced atomic layer deposition of Al2O3 by six methods
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Materials Science in Semiconductor …,
2022 |
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[10]
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Use of plasma oxidation for conversion of metal salt infiltrated thin polymer films to metal oxide
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Journal of Physics D …,
2022 |
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[11]
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MOx materials by ALD method
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Metal Oxides for Non-Volatile Memory,
2022 |
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[12]
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Untersuchungen zum Einsatz des ms-Blitzlampentemperns bei der Atomlagenabscheidung von dünnen Schichten und für die Rekristallisation von …
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2021 |
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[13]
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Growth of ultrathin Al2O3 islands on hBN particles by atomic layer deposition in a custom fluidized bed reactor using Al (CH3) 3 and H2O
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2021 |
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[14]
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3-D Vertical via Nitrogen-Doped Aluminum Oxide Resistive Random-Access Memory
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2021 |
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[15]
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Selective-area growth study of GaN micropillars for quasi-vertical Schottky diodes
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2021 |
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[16]
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Boosting Catalytic Lifetime in Chemical Vapor Deposition of Carbon Nanotubes by Rapid Thermal Pretreatment of Alumina-Supported Metal Nanocatalysts
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Chemistry of …,
2021 |
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[17]
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Fabrication, Characterization, and Modeling of an Aluminum Oxide-Gate Ion-Sensitive Field-Effect Transistor-Based pH Sensor
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Journal of Electronic …,
2021 |
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[18]
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Comparison of the Growth and Thermal Properties of Nonwoven Polymers after Atomic Layer Deposition and Vapor Phase Infiltration
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Coatings,
2021 |
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[19]
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Optical study of electron and acoustic phonon confinement in ultrathin-body germanium-on-insulator nanolayers
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2021 |
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[20]
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Catalyst deactivation by carbon deposition: The remarkable case of nickel confined by atomic layer deposition
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2021 |
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[21]
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The Effect of Atomic Layer Deposited Overcoat on Co-Pt-Si/γ-Al2O3 Fischer–Tropsch Catalyst
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2021 |
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[22]
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Structure and Properties of the Al–B–Si–C Coatings Deposited by Magnetron Sputtering
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2020 |
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[23]
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Atomic layer deposition Al2O3-passivated AlGaN/GaN high-electron-mobility transistors on Si (111) towards reliable high-speed electronics
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2020 |
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[24]
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A comparative study on atomic layer deposited oxide film morphology and their electrical breakdown
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2020 |
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[25]
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Normally-off Transistor Topologies in Gallium Nitride Technology
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2020 |
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[26]
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Mapping Graphene Grain Orientation by the Growth of WS2 Films with Oriented Cracks
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2020 |
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[27]
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A Thin Alumina Film as a Tritium Adsorption Inhibitor for Stainless Steel 316
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2020 |
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[28]
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Quantifying the Extent of Ligand Incorporation and the Effect on Properties of TiO2 Thin Films Grown by Atomic Layer Deposition Using an Alkoxide or an Alkylamide
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2020 |
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[29]
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GaN Micropillar Schottky Diodes with High Breakdown Voltage Fabricated by Selective‐Area Growth
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2019 |
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[30]
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Epitaxy of High-Quality Single-Crystal Hexagonal Perovskite YAlO3 on GaAs(111)A Using Laminated Atomic Layer Deposition
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2019 |
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[31]
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Surface reconstruction causes structural variations in nanometric amorphous Al 2 O 3
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2019 |
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[32]
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Atomic layer deposited TiO2 and Al2O3 thin films as coatings for aluminum food packaging application
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2019 |
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[33]
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Thermal degradation of refractory layered metamaterial for thermophotovoltaic emitter under high vacuum condition
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2019 |
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[34]
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Interface characteristics comparison of sapphire direct and indirect wafer bonded structures by transmission electron microscopy
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2019 |
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[35]
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Hardness and modulus of elasticity of atomic layer deposited Al2O3-ZrO2 nanolaminates and mixtures
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2019 |
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[36]
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Passivation of Detector‐Grade Float Zone Silicon with Atomic Layer Deposited Aluminum Oxide
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2019 |
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[37]
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Investigation of annealed, thin (∼ 2.6 nm)-Al2O3/AlGaN/GaN metal-insulator-semiconductor heterostructures on Si (111) via capacitance-voltage and current-voltage …
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2019 |
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[38]
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Investigating Heteroepitaxy Principles and Transport Characteristics of Vertically Integrated GaN-on-Graphene Heterostructures
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2019 |
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[39]
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Passivation of Detector‐Grade FZ‐Si with ALD‐Grown Aluminium Oxide
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2019 |
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[40]
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Inelastic H-Atom scattering from ultra-thin films
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2018 |
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[41]
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Forming-Free Aluminum Oxide Nitride Resistive Random Access Memory by Atomic Layer Deposition Technique
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2018 |
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[42]
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Propiedades luminiscentes y estructurales de las películas delgadas de oxinitruro de aluminio dopado con iterbio obtenidas por metodologías combinatorias
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2018 |
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[43]
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Effect of post deposition annealing and post metallization annealing on electrical and structural characteristics of Pd/Al2O3/6H-SiC MIS capacitors
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2018 |
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[44]
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Development and Investigation of Metal Oxide Nanostructures for Sensing Applications
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2018 |
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[45]
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MOCVD Compatible Atomic Layer Deposition Process of Al2O3 on SiC and Graphene/SiC Heterostructures
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2018 |
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[46]
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Ultra-thin ALD-AlOx/PEDOT:PSS hole selective passivated contacts: An attractive low cost approach to increase solar cell performance
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Solar Energy Materials and Solar Cells,
2018 |
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[47]
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Effects of substrate heating and post-deposition annealing on characteristics of thin MOCVD HfO 2 films
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2018 |
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[48]
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Development of extremely low temperature processed oxide thin film transistors via atmospheric steam reforming treatment: Interface, surface, film curing
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Journal of Alloys and Compounds,
2018 |
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[49]
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Influence of annealing environment on the ALD-Al2O3/4H-SiC interface studied through XPS
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Journal of Physics D: Applied Physics,
2018 |
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[50]
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Effects of substrate heating and post-deposition annealing on characteristics of thin MOCVD HfO2 films
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IOP Conference Series: Materials Science and Engineering,
2018 |
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[51]
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Effect of Sm doping and annealing on magnetic and structural properties of sputter deposited SnO2 thin films
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Materials Research Express,
2018 |
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[52]
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Obtaining low resistivity (∼100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
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2018 |
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[53]
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Inelastic H-Atom scattering from ultra-thin films.
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Dissertation,
2018 |
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[54]
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Obtaining low resistivity (∼ 100 μΩ cm) TiN films by plasma enhanced atomic layer deposition using a metalorganic precursor
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Journal of Vacuum …,
2018 |
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[55]
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היפוסוליפל רוטקוד
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2018 |
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[56]
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Statistics-Based Analysis of the Evolution of Structural and Electronic Properties of Realistic Amorphous Alumina During the Densification Process: Insights from First …
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The Journal of Physical Chemistry C,
2017 |
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[57]
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Silicon surface passivation properties of aluminum oxide grown by atomic layer deposition for low temperature solar cells processes
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Thèse,
2017 |
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[58]
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Decoupling the Effects of Mass Density and Hydrogen-, Oxygen-, and Aluminum-Based Defects on Optoelectronic Properties of Realistic Amorphous Alumina
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Journal of Physical Chemistry (JPC) Letters,
2017 |
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[59]
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Microstructural features affecting optical properties of vacuum kinetic sprayed Al2O3 thin film
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Surfaces and Interfaces,
2017 |
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[60]
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Qualifying ultrathin alumina film prepared by plasma-enhance atomic layer deposition under low temperature operation
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Thin Solid Films,
2017 |
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[61]
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Density of Nanometrically Thin Amorphous Films Varies by Thickness
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Chemistry of Materials,
2017 |
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[62]
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Flexible thin film pH sensor based on low‐temperature atomic layer deposition
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physica status solidi (RRL)-Rapid Research Letters,
2017 |
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[63]
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Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition
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Surface and Coatings Technology,
2017 |
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[64]
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Fluoride removal in waters using ionic liquid-functionalized alumina as a novel adsorbent
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Journal of Cleaner Production,
2017 |
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[65]
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High-k/GaN interface engineering toward AlGaN/GaN MIS-HEMT with improved Vth stability
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2017 |
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[66]
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Potency of commercial TiO2‐P25 nanoparticles to form stainless steel protective coating
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International Journal of Applied Ceramic Technology,
2017 |
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[67]
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Oxygen-promoted catalyst sintering influences number density, alignment, and wall number of vertically aligned carbon nanotubes
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Nanoscale,
2017 |
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[68]
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Decoupling the Effects of Mass Density and Hydrogen-, Oxygen-and Aluminum-based Defects on Optoelectronic Properties of Realistic Amorphous Alumina.
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The Journal of Physical Chemistry Letters,
2017 |
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[69]
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Depth resolved compositional analysis of aluminium oxide thin film using non-destructive soft x-ray reflectivity technique
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Applied Surface Science,
2017 |
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[70]
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Normally-off fully recess-gated GaN metal–insulator–semiconductor field-effect transistor using Al2O3/Si3N4 bilayer as gate dielectrics
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Applied Physics Express,
2017 |
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[71]
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Electronic conduction mechanisms in insulators
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2017 |
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[72]
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Solid state electron transport via myoglobin protein and the role of substrate-protein coupling in such systems
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2017 |
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[73]
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Atomic layer deposition of thin films: from functional devices to protective coatings
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2016 |
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[74]
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Tuning of nanoantenna resonances in the mid-infrared spectral range using phase-change materials
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Thesis,
2016 |
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[75]
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Influences of annealing on structural and compositional properties of Al2O3 thin films grown on 4H–SiC by atomic layer deposition 简
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中国物理B: 英文版,
2016 |
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[76]
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Influences of annealing on structural and compositional properties of Al2O3 thin films grown on 4H-SiC by atomic layer deposition
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中国物理B: 英文版,
2016 |
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[77]
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Effect of SiO2 interlayer on the properties of Al2O3 thin films grown by plasma enhanced atomic layer deposition on 4H‐SiC substrates
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physica status solidi (a),
2016 |
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[78]
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Atomic Layer Deposition of Al2O3 Thin Films Using Dimethyl Aluminum sec-Butoxide and H2O Molecules
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2016 |
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[79]
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Integrated low‐temperature process for the fabrication of amorphous Si nanoparticles embedded in Al2O3 for non‐volatile memory application
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physica status solidi (a),
2016 |
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[80]
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Improving the photoelectrocatalytic performance of boron-modified TiO 2/Ti sol–gel-based electrodes for glycerol oxidation under visible illumination
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RSC Advances,
2016 |
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[81]
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Investigation of Line-Scan Dispersive Interferometry for In-Line Surface Metrology
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2016 |
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[82]
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Influences of annealing on structural and compositional properties of Al2O3 thin films grown on 4H–SiC by atomic layer deposition
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Chinese Physics B,
2016 |
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[83]
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New processing techniques for large-area electronics
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2016 |
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[84]
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Improving the photoelectrocatalytic performance of boron-modified TiO2/Ti sol–gel-based electrodes for glycerol oxidation under visible illumination
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2016 |
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[85]
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Influences of annealing on structural and compositional properties of Al_2O_3 thin films grown on 4H–SiC by atomic layer deposition
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2016 |
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[86]
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Corrosion barriers for silver-based telescope mirrors: comparative study of plasma-enhanced atomic layer deposition and reactive evaporation of aluminum oxide
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Journal of Astronomical Telescopes, Instruments, and Systems,
2015 |
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[87]
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Nucleation, Growth, and Electrical Characterization of Al2O3 Thin Films Grown by Atomic Layer Deposition
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2015 |
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[88]
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Metalorganic chemical vapor deposition of Al 2 O 3 using trimethylaluminum and O 2 precursors: Growth mechanism and crystallinity
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Journal of Crystal Growth,
2014 |
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[89]
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Metalorganic chemical vapor deposition of Al 2 O 3 using trimethylaluminum and O 2 precursors: Growth mechanism and crystallinity
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Journal of Crystal Growth,
2014 |
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[90]
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Metalorganic chemical vapor deposition of Al2O3 using trimethylaluminum and O2 precursors: Growth mechanism and crystallinity
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Journal of Crystal Growth,
2014 |
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[91]
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Dielectric materials by Atomic Layer Deposition for microelectronics applications
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[92]
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AFRL-AFOSR-VA-TR-2019-0241
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