Author(s)

Sonachand Adhikari^1,2*, Saroj Kanta Patra^1,2, Ashok Lunia¹, Sandeep Kumar¹, Priyavart Parjapat¹, Bhoopendra Kushwaha¹, Pawan Kumar¹, Sumitra Singh¹, Ashok Chauhan¹, Kuldip Singh¹, Suchandan Pal^1,2, C. Dhanavantri^1,2

¹CSIR-Network of Institutes for Solar Energy (CSIR-NISE), CSIR-Central Electronics Engineering Research Institute (CSIR-CEERI), Pilani, Rajasthan, India.
²Academy of Scientific and Innovative Research (AcSIR), Chennai, Tamil Nadu, India.

GaN/InGaN based violet light emitting diodes (LEDs), emitting at 430 nm, have been grown on conventional single side polished (SSP) and patterned sapphire substrates (PSS). Characteristics of the epitaxial wafers and subsequently fabricated LEDs have been analyzed. The photoluminescence (PL) peaks have been observed at 428.1 nm 426.1 nm for the epitaxial layers on SSP and PSS respectively. The PL intensity is 2.9 times higher in the case of PSS. The electroluminescence (EL) peaks have been observed at 430.78 nm and 430.35 nm for the LEDs on SSP and PSS respectively. The light output from LED fabricated on the PSS is 2.15 times higher than that of the LED on SSP at a forward current of 100 mA.

LED, GaN/InGaN, PSS

Adhikari, S. , Patra, S. , Lunia, A. , Kumar, S. , Parjapat, P. , Kushwaha, B. , Kumar, P. , Singh, S. , Chauhan, A. , Singh, K. , Pal, S. and Dhanavantri, C. (2014) Growth and Fabrication of GaN/InGaN Violet Light Emitting Diode on Patterned Sapphire Substrate. Journal of Applied Mathematics and Physics, 2, 1113-1117. doi: 10.4236/jamp.2014.212129.