Author(s)

Jolanta Romanowska, Maryana Zagula-Yavorska, Jan Sieniawski, Janusz Markowski

Departament of Materials Science, Rzeszow University of Technology, Rzeszow, Poland.
Faculty of Microsystem Electronics and Photonics, Wroclaw University of Technology, Wroc?aw, Poland.

The paper presents the comparison of the structures of the zirconium modified aluminide coatings deposited on pure nickel by the CVD and PVD methods. In the CVD process, zirconium was deposited from the ZrCl3 gas phase at the 1000°C. Zirconium thin layer (1 or 7 μm thick) and aluminum thin layer (1.0, 0.7 or 0.5 μm thick) were deposited by the EB-PVD method. Deposition velocity was about 1 ?m/min. The layers obtained by the Electron Beam Evaporation method were subjected to diffusion treatment for 2 h in the argon atmosphere. The obtained coatings were examined by the use of an optical microscope (microstructure and coating thickness) a scanning electron microscope (chemical composition on the cross-section of the modified aluminide coating) and XRD phase analysis. Microstructures and phase compositions of coatings obtained by different methods differ significantly. NiAl(Zr), Ni3Al and Ni(Al) phases were found in the CVD aluminide coatings, whereas Ni5Zr, Ni7Zr2 and γNi(Al,Zr) were observed in coatings obtained by the PVD method. The results indicate that the microstructure of the coating is strongly influenced by the method of manufacturing.

CVD Method; PVD Method; Zirconium Modified Aluminide Coatings

J. Romanowska, M. Zagula-Yavorska, J. Sieniawski and J. Markowski, "Zirconium Modified Aluminide Coatings Obtained by the CVD and PVD Methods," Open Journal of Metal, Vol. 3 No. 4, 2013, pp. 92-99. doi: 10.4236/ojmetal.2013.34014.