Plasma-Assisted Chemical Vapor Deposition of TiO2 Thin Films for Highly Hydrophilic Performance - Crystal Structure Theory and Applications

CSTA > Vol.2 No.1, March 2013

Crystal Structure Theory and Applications

Volume 2, Issue 1 (March 2013)

ISSN Print: 2169-2491 ISSN Online: 2169-2505

Google-based Impact Factor: 0.43 Citations

Plasma-Assisted Chemical Vapor Deposition of TiO₂ Thin Films for Highly Hydrophilic Performance ()

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DOI: 10.4236/csta.2013.21001 5,699 Downloads 9,876 Views Citations

Author(s)

Satoshi Yamauchi, Yoh Imai

Affiliation(s)

Department of Biomolecular Functional Engineering, Ibaraki University, Hitachi, Japan.
Department of Electric and Electronic Engineering, Ibaraki University, Hitachi, Japan.

ABSTRACT

Titanium-oxide layer was grown on glass substrate by plasma-assisted chemical vapor deposition (PCVD) using oxygen gas plasma excited by radio-frequency power at 13.56 MHz in the pressure as low as 3mtorr at relatively low temperature below 400^oC, and studied on the crystallographic properties with the hydrophilic behavior comparing to the layer deposited by low-pressure chemical vapor deposition (LPCVD). Raman spectra indicated anatase-phase TiO₂ layer without amorphous-phase could be formed above 340^oC by simultaneous supply of plasma-cracked and non-cracked titanium-tetra-iso-propoxide (TTIP) used as preliminary precursor. Surface Scanning Electron Microscope images indicated the PCVD-layer consists of distinct nanometer-size plate-like columnar grains, in contrast to rugged micrometer-size grains in the LPCVD-layer. Extremely small water contact angle about 5^o in dark and the quick conversion to super-hydrophilicity by UV-irradiation with a light-power density as low as 50 W/cm² were observed on the PCVD- layer grown at 380^oC, while the large initial contact angle was above 40^o and the response for the UV-irradiation was gradual on the LPCVD-layer.

KEYWORDS

PCVD; Titanium-Oxide Films; Anatase-TiO₂; Hydrophilicity

Share and Cite:

S. Yamauchi and Y. Imai, "Plasma-Assisted Chemical Vapor Deposition of TiO₂ Thin Films for Highly Hydrophilic Performance," Crystal Structure Theory and Applications, Vol. 2 No. 1, 2013, pp. 1-7. doi: 10.4236/csta.2013.21001.

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