Author(s)

Marcos Iván Oliva^1,2,3*, Carlos Iván Zandalazini², Juan Carlos Ferrero¹, Hector Raúl Bertorello^1,2

¹Centro Láser de Ciencias Moleculare, Departamento de Fisicoquímica, Facultad de Ciencias Químicas, Universidad Nacional de Córdoba, Ciudad Universitaria, Córdoba, Argentina.
²Grupo de Ciencia de Materiales, Facultad de Matemática Astronomía y Física, Universidad Nacional de Córdoba, Ciudad Universitaria, Córdoba, Argentina.
³Instituto de Física Enrique Gaviola, Consejo Nacional de Investigaciones Científicas y Técnicas (CONICET), Córdoba, Argentina.

.Pulsed Laser Deposition (PLD) is a powerful technique to grow thin films. Oxides, Magnetics and superconducting materials have been obtained by PLD and theirs properties are strongly dependent of deposition parameters. The construction of a simple and cheap PLD system that is suitable for growing various thin films, including magnetic materials, controlling some deposition parameters is presented. The design characteristics and construction are presented for each one of the devices that compose this PLD system. The equipment has the possibility of carrying out films deposition using up to five targets under controlled atmosphere and substrate temperature. The system also allows controlling the cool off sample time after growing up films at high temperatures. A wide range of relative speeds between target and substrate axial rotation can be externally controlled. With the configuration and the dimensions adopted in their construction, a PLD system of great experimental flexibility is achieved, at a very low cost regarding the commercial systems. To evaluate their performance and effectiveness, the deposition characteristics of a BaFe₁₂O₁₉ film on (0001) sapphire substrate is presented.

Pulsed Laser Deposition; Thin Film; Multilayer

M. Oliva, C. Zandalazini, J. Ferrero and H. Bertorello, "Development of a Low Cost Pulsed Laser Deposition System for Thin Films Growth," Modern Instrumentation, Vol. 1 No. 4, 2012, pp. 41-48. doi: 10.4236/mi.2012.14006.