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[1]
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Evaluation of the effect of hydrogen plasma treatment on the chemical bonding state and distribution of hydrogen in silicon nitride films by angle-resolved hard X-ray photoelectron spectroscopy
Japanese Journal of Applied Physics,
2025
DOI:10.35848/1347-4065/ada9f7
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[2]
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Control of self-propagating reactions and phases in Ni/Si reactive multilayers
Journal of Materials Chemistry C,
2025
DOI:10.1039/D4TC04495A
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[3]
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Achieving Ultrafast Growth of Large-Scale Single-Phase Ni Silicide by Controlling the Bilayer Thickness of a Reactive Multilayer
The Journal of Physical Chemistry C,
2024
DOI:10.1021/acs.jpcc.4c04999
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[4]
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Investigations on argon and hydrogen plasmas produced by compact ECR plasma source
Plasma Research Express,
2019
DOI:10.1088/2516-1067/ab3f90
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[5]
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Formation of Poly-Si Films on Glass Substrates by Using Microwave Plasma Heating and Fabrication of TFT’s on the Films
Journal of Materials Science and Chemical Engineering,
2018
DOI:10.4236/msce.2018.61003
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[6]
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STEM Moiré Observation of Lattice-Relaxed Germanium Grown on Silicon
Journal of Materials Science and Chemical Engineering,
2017
DOI:10.4236/msce.2017.51014
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[7]
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Reduction of Dislocation Densities of Ge Layers Grown on Si Substrates by Using Microwave Plasma Heating and Fabrication of High Hole Mobility MOSFETs on Ge Layers
Journal of Materials Science and Chemical Engineering,
2017
DOI:10.4236/msce.2017.51006
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[8]
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Ohmic Contact Formation for n+4H-SiC Substrate by Selective Heating Method Using Hydrogen Radical Irradiation
Journal of Materials Science and Chemical Engineering,
2017
DOI:10.4236/msce.2017.51005
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