"
Experimental Characterization of ALD Grown Al2O3 Film for Microelectronic Applications"
written by Yuxi Wang, Yida Chen, Yong Zhang, Zhaoxin Zhu, Tao Wu, Xufeng Kou, Pingping Ding, Romain Corcolle, Jangyong Kim,
published by
Advances in Materials Physics and Chemistry,
Vol.11 No.1, 2021
has been cited by the following article(s):
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[1]
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[2]
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[3]
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ChemNanoMat,
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[4]
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The planar anodic Al2O3-ZrO2 nanocomposite capacitor dielectrics for advanced passive device integration
Science and Technology of Advanced Materials,
2023
DOI:10.1080/14686996.2022.2162324
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[5]
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The planar anodic Al
2
O
3
-ZrO
2
nanocomposite capacitor dielectrics for advanced passive device integration
Science and Technology of Advanced Materials,
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DOI:10.1080/14686996.2022.2162324
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[6]
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Structure, Oxygen Content and Electric Properties of Titanium Nitride Electrodes in TiNx/La:HfO2/TiNx Stacks Grown by PEALD on SiO2/Si
Nanomaterials,
2022
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[7]
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Structure, Oxygen Content and Electric Properties of Titanium Nitride Electrodes in TiNx/La:HfO2/TiNx Stacks Grown by PEALD on SiO2/Si
Nanomaterials,
2022
DOI:10.3390/nano12203608
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