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Journal of Materials Science and Chemical Engineering
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Journal of Materials Science and Chemical Engineering
ISSN Print:
2327-6045
ISSN Online:
2327-6053
www.scirp.org/journal/msce
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msce@scirp.org
Google-based Impact Factor:
1.21
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"
Catalyst-Free Growth of Graphene by Microwave Surface Wave Plasma Chemical Vapor Deposition at Low Temperature
"
written by
Sudip Adhikari, Hare Ram Aryal, Hideo Uchida, Masayoshi Umeno
,
published by
Journal of Materials Science and Chemical Engineering
,
Vol.4 No.3, 2016
has been cited by the following article(s):
Google Scholar
CrossRef
[1]
Recent progress in low-temperature CVD growth of 2D materials
Oxford Open Materials Science
,
2023
[2]
Синтез и исследование свойств тонких углеродных пленок, полученных методом осаждения в плазме CH4 и последующей термообработкой …
2023
[3]
A review of graphene synthesisatlow temperatures by CVD methods
2020
[4]
低温 CVD 法制备石墨烯的研究进展
2020
[5]
Single-step growth of graphene and graphene-based nanostructures by plasma-enhanced chemical vapour deposition
2019
[6]
Direct CVD growth of graphene on technologically important dielectric and semiconducting substrates
2018
[7]
A catalytic, catalyst-free, and roll-to-roll production of graphene via chemical vapor deposition: Low temperature growth
Carbon
,
2018
[8]
Low temperature plasma enchanced chemical vapor deposition of graphene layers
2017
[9]
A review of surface engineering of Graphene for electrochemical sensing applications
2017
[1]
Comprehensive Materials Processing
2024
DOI:
10.1016/B978-0-323-96020-5.00275-2
[2]
Comprehensive Materials Processing
2024
DOI:
10.1016/B978-0-323-96020-5.00275-2
[3]
A review of graphene synthesisatlow temperatures by CVD methods
New Carbon Materials
,
2020
DOI:
10.1016/S1872-5805(20)60484-X
[4]
Single-step growth of graphene and graphene-based nanostructures by plasma-enhanced chemical vapor deposition
Nanotechnology
,
2019
DOI:
10.1088/1361-6528/aafdbf
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