Nanostructure of Rutile TiO<sub>2</sub> Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering

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ISSN Print: 2153-117X
ISSN Online: 2153-1188
www.scirp.org/journal/msa
E-mail: msa@scirp.org

"Nanostructure of Rutile TiO₂ Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering"
written by Wichai Kongsri, Supanee Limsuwan, Surasing Chaiyakun, Pichet Limsuwan, Chittra Kedkaew,
published by Materials Sciences and Applications, Vol.10 No.3, 2019

has been cited by the following article(s):

[1]	The influence of nitrogen partial pressure on visible-light-driven photocatalytic activity of Sputtered Titanium oxynitride thin films
	2021

[2]	Low-temperature electrical characteristics of nanocrystalline BaTiO3 thin films for cryogenic applications
	Materials Letters: X, 2021

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[1]	Correlation between sputtering method, microstructure and properties of TiOx thin films deposited by reactive direct-current and high-power impulse magnetron sputtering Thin Solid Films, 2024 DOI:10.1016/j.tsf.2024.140573

[2]	Low-temperature electrical characteristics of nanocrystalline BaTiO3 thin films for cryogenic applications Materials Letters: X, 2021 DOI:10.1016/j.mlblux.2021.100090