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Crystal Structure Theory and Applications
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Crystal Structure Theory and Applications
ISSN Print:
2169-2491
ISSN Online:
2169-2505
www.scirp.org/journal/csta
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csta@scirp.org
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"
Effect of Chamber Conditions and Substrate Type on PECVD of SiGeSn Films
"
written by
Venkat Hariharan, Jignesh Vanjaria, Arul Chakkaravarthi Arjunan, Gary S. Tompa, Hongbin Yu
,
published by
Crystal Structure Theory and Applications
,
Vol.10 No.3, 2021
has been cited by the following article(s):
Google Scholar
CrossRef
No relevant information.
[1]
Obtaining semiconductor structures Si-Si
1-x
Ge
x
-Si
1-x-y
Ge
x
Sn
y
from the liquid phase in a single technological cycle
Functional Materials
,
2022
DOI:
10.15407/fm29.02.202
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