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Journal of Minerals and Materials Characterization and Engineering
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Journal of Minerals and Materials Characterization and Engineering
ISSN Print:
2327-4077
ISSN Online:
2327-4085
www.scirp.org/Journal/jmmce
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jmmce@scirp.org
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"
Influence of Sputter Deposition Time on the Growth of c-Axis Oriented AlN/Si Thin Films for Microelectronic Application
"
written by
V. VasanthiPillay, K. Vijayalakshmi
,
published by
Journal of Minerals and Materials Characterization and Engineering
,
Vol.11 No.7, 2012
has been cited by the following article(s):
Google Scholar
CrossRef
[1]
Estudio de la heteroestructura GaN/AIN/Si (111) crecidas por epitaxia de haces moleculares
2022
[2]
Growth, structural and electrical properties of AlN/Si (111) for futuristic MEMS applications
2021
[3]
Electrical and structural characteristics of sputtered c-oriented AlN thin films on Si (100) and Si (110) substrates
Thin Solid Films
,
2018
[4]
Influence of Process Parameters and Formation of Highly c-Axis Oriented AlN Thin Films on Mo by Reactive Sputtering
Journal of Electronic Materials
,
2018
[5]
Growth defects in CrN/NbN coatings deposited by HIPIMS/UBM techniques
2017
[6]
Growth Defects in CrN/NbN Coatings Deposited by HIPIMS/UBM technique
2017
[7]
Effect of chamber pressure on defect generation and their influence on corrosion and tribological properties of HIPIMS deposited CrN/NbN coatings
Surface and Coatings Technology
,
2017
[8]
Study of Coating Defects and their Influence on Corrosion and Tribological Properties of HIPIMS Deposited CrN/NbN Coatings
60th Annual Technical Conference Proceedings Providence, Rhode Island
,
2017
[9]
Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition
Semiconductor Science and Technology
,
2016
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