Author(s)

V.I Talanin, I.E Talanin, N.Ph Ustimenko

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As a virtual experimental device for analysis and calculation of grown-in microdefects formation in undoped silicon dislocation-free single crystals the software is proposed. The software is built on the basis on diffusion model of formation, growth and coalescence of grown-in microdefects. Diffusion model describes kinetics of defect structure changes during cooling after growth on crystallization temperature to room temperature. The software allows the use of personal computer to investigate the defect structure of dislocation-free silicon single crystals with a diameter on 30 mm to 400 mm grown by floating-zone and Czochralski methods.

Silicon, Grown-In Microdefects, Precipitate, Vacancy Microvoid, Interstitial Dislocation Loop

V. Talanin, I. Talanin and N. Ustimenko, "A New Method for Research of Grown-In Microdefects in Dislocation-Free Silicon Single Crystals," Journal of Crystallization Process and Technology, Vol. 1 No. 2, 2011, pp. 13-17. doi: 10.4236/jcpt.2011.12003.