Effect of Target-to-Substrate Distance and Sputtering Angle on Property of Cu and Fe Films

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ABSTRACT

Cu and Fe monolarys were preperaed by dc magnetron sputtering on glass substrters with changing the target-to-substrate distance d and the sputtering angle β. Texture and grain size of samples were affected by changing d and β which were revealed by X-ray diffraction. Magnetic hysteresis loops examined by a vibration sample magnetometer (VSM) showed that texture and grain size would affect its magnetic.

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