Journal of Materials Science and Chemical Engineering

Volume 5, Issue 12 (December 2017)

ISSN Print: 2327-6045   ISSN Online: 2327-6053

Google-based Impact Factor: 0.72  Citations  

Copper and Nitrogen Co-Doping Effect on Visible-Light Responsive Photocatalysis of Plasma-Nitrided Copper-Doped Titanium Oxide Film

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DOI: 10.4236/msce.2017.512005    1,235 Downloads   3,011 Views  Citations

ABSTRACT

In order to clarify the visible-light responsive photocatalysis of TiO2 co-doped with Cu and N atoms, plasma-nitridation was taken place to Cu-doped TiO2 film. Cu-doped TiO2 films were prepared by dip-coating method and they were nitrided by nitrogen plasma in the plasma-enhanced CVD system. Cu-doped TiO2 films before and after plasma-nitridation show similar X-ray diffraction peaks of anatase TiO2. XPS analysis reveals that the ionic states of Ti and Cu in the Cu-doped TiO2 films are Ti4+ and Cu+, respectively. After nitrogen plasma treatment, oxygen atoms are released by substitution of nitrogen atoms in the TiO2 matrix, so that Cu+ is oxidized to generate Cu2+ and at the same time oxygen vacancy is formed. The absorption edge of both Cu-doped and plasma-nitrided Cu-doped TiO2 did red shift. Visible-light responsive photocatalytic activity of the Cu-doped TiO2 film degraded after nitrogen plasma treatment.

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Hirota, K. and Maeda, M. (2017) Copper and Nitrogen Co-Doping Effect on Visible-Light Responsive Photocatalysis of Plasma-Nitrided Copper-Doped Titanium Oxide Film. Journal of Materials Science and Chemical Engineering, 5, 52-62. doi: 10.4236/msce.2017.512005.

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