Unique Pulsed-Laser Deposition Production of Anatase and Rutile TiO2 on Al2O3 - Crystal Structure Theory and Applications

CSTA > Vol.7 No.2, May 2018

Unique Pulsed-Laser Deposition Production of Anatase and Rutile TiO₂ on Al₂O₃ ()

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DOI: 10.4236/csta.2018.72002 965 Downloads 2,646 Views Citations

Author(s)

Alexandra Gordienko¹, Anthony B. Kaye^1,2

Affiliation(s)

¹Department of Physics and the Nano Tech Center, Texas Tech University, Lubbock, Texas, USA.
²United States Air Force Nuclear Weapons Center, 1551 Wyoming Blvd., Kirtland Air Force Base, New Mexico, USA.

ABSTRACT

Two pure hexagonal phases of titanium dioxide, anatase and rutile, were grown on c-cut Al₂O₃ substrates via pulsed-laser deposition by changing only the growth and annealing conditions, but without changing the substrate, target, or working gas. Purity of each phase was confirmed by x-ray diffraction, the quality of each film was studied using atomic force microscopy and scanning electron microscopy, and the interface between each substrate and film was studied using x-ray photoelectron spectroscopy. A binding layer of Ti₂O₃ was found to explain anatase growth under the very large lattice mismatch conditions.

KEYWORDS

Titania, Anatase, Rutile, Sapphire, PLD

Share and Cite:

Gordienko, A. and Kaye, A. (2018) Unique Pulsed-Laser Deposition Production of Anatase and Rutile TiO₂ on Al₂O₃. Crystal Structure Theory and Applications, 7, 19-31. doi: 10.4236/csta.2018.72002.

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