has been cited by the following article(s):
[1]
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Maskless lithography based on digital micromirror device (DMD) and double sided microlens and spatial filter array
Optics & Laser Technology,
2019
DOI:10.1016/j.optlastec.2019.01.001
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[2]
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Maskless Lithography Using Negative Photoresist Material: Impact of UV Laser Intensity on the Cured Line Width
Lasers in Manufacturing and Materials Processing,
2018
DOI:10.1007/s40516-018-0058-2
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[3]
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Maskless beam pen lithography based on integrated microlens array and spatial-filter array
Optical Engineering,
2017
DOI:10.1117/1.OE.56.11.115104
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[4]
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Dynamic generation of Ince-Gaussian modes with a digital micromirror device
Journal of Applied Physics,
2015
DOI:10.1063/1.4915478
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[5]
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Replacing scanning based laser processing applications with variable mask image amplification systems using TI DMD, pulsed Nd:YAG lasers, and amplifiers
Emerging Digital Micromirror Device Based Systems and Applications VII,
2015
DOI:10.1117/12.2086490
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[6]
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Dynamic generation of Ince-Gaussian modes with a digital micromirror device
Journal of Applied Physics,
2015
DOI:10.1063/1.4915478
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[7]
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Digital generation and control of Hermite–Gaussian modes with an amplitude digital micromirror device
Journal of Optics,
2015
DOI:10.1088/2040-8978/17/12/125604
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