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Scarel, G., Bonera, E., Wiemer, C., Tallarida, G., Spiga, S., Fanciulli, M., Fedushkin, I.L., Schumann, H., Lebiedinskii, Y. and Zenkevich, A. (2004) Atomic-Layer Deposition of Lu2O3. Applied Physics Letters, 85, 630-632.
https://doi.org/10.1063/1.1773360
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