Oka, T., Ueno, Y., Ina, T. and Hasegawa, K. (2014) Vertical GaN-based Trench Metal Oxide Semiconductor Field-Effect Transistors on A Free-Standing GaN Substrate with Blocking Voltage of 1.6 kV. Applied Physics Express, 7, Article ID: 021002.
https://doi.org/10.7567/APEX.7.021002

has been cited by the following article:

• TITLE: A Novel High Performance of GaN-Based HEMT with Two Channel Layers of GaN/InAlGaN

  AUTHORS: Reza Karami, Masoud Sabaghi, Massoud Masoumi

  KEYWORDS: Mole Fraction, GaN/InAlGaN, Breakdown Voltage, High Electron Mobility Transistor (HEMT)

  JOURNAL NAME: World Journal of Engineering and Technology, Vol.5 No.2, May 27, 2017

  ABSTRACT: The potential impact of GaN-based high electron mobility transistor (HEMT) with two channel layers of GaN/InAlGaN is reported. Using two-dimensional and two-carrier device simulations, we investigate the device performance focusing on the electrical potential, electron concentration, breakdown voltage and transconductance (gm). Also, the results have been compared with structure of AlGaN/GaN HEMT. Our simulation results reveal that the proposed structure increases electron concentration, breakdown voltage and transconductance; and reduces the leakage current. Also, the mole fraction of aluminum in the InAlGaN has been optimized to create the best performing device.