Okamoto, Y., Nitta, Y., Imanaka, T. and Teranishi, S. (1979) Surface Characterisation of Nickel Boride and Nickel Phosphide Catalysts by X-Ray Photoelectron Spectroscopy. Journal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases, 75, 2027-2039.
https://doi.org/10.1039/f19797502027

has been cited by the following article:

• TITLE: XPS Studies on Electroless As-Deposited and Annealed Ni-P Films

  AUTHORS: Towhid Adnan Chowdhury

  KEYWORDS: Ni-P, X-Ray Photoelectron Spectroscopy, Annealing, Electroless Deposition, Binding Energy, Reducing Agent

  JOURNAL NAME: Engineering, Vol.16 No.5, May 23, 2024

  ABSTRACT: Electroless deposition has been used to deposit Ni-P films on glass slides using the reducing agent sodium hypophosphite. This has been done with a purpose to use Ni-P films as back contact for silicon carbide radiation detectors. By keeping deposition time, temperature, pH and concentration of the precursor solution constant, the film deposition has been done. XPS studies were done to analyze the composition and stoichiometry of Ni-P thin films.