Journal of Crystallization Process and Technology

Journal of Crystallization Process and Technology

ISSN Print: 2161-7678
ISSN Online: 2161-7686
www.scirp.org/journal/jcpt
E-mail: jcpt@scirp.org
Citations    
"Plasma-Assisted Chemical Vapor Deposition of Titanium Oxide Layer at Room-Temperature"
written by Satoshi Yamauchi, Hiromi Suzuki, Risa Akutsu,
published by Journal of Crystallization Process and Technology, Vol.4 No.1, 2014
has been cited by the following article(s):
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[2] Nanofriction Properties of Mono- and Double-Layer Ti3C2Tx MXenes
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[3] Functionalization of Nanoparticulate Thin-film Fabrication for Enhanced Properties Via a One-step Gas Phase Method
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[4] Fabrication of Z-scheme Bi2WO6/CNT/TiO2 heterostructure with enhanced cephalexin photodegradation: Optimization and reaction mechanism
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[5] A spherical TiO2-Bi2WO6 composite photocatalyst for visible-light photocatalytic degradation of ethylene
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[6] Développement par procédé plasma de couches minces de type TiO2 dopé à l'azote pour la production d'hydrogène par photo-électrolyse de l'eau sous lumière …
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[7] Plasma synthesis of photocatalytic TiOx thin films
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[8] Plasma synthesis of photocatalytic TiO x thin films
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[9] Surface treatment of TiO 2 nanoparticles via sol–gel method: Effect of silane type on hydrophobicity of the nanoparticles
Progress in Organic Coatings, 2015
[10] Enhanced Photo-Induced Property of LPCVD-TiO2 Layer on PCVD-TiOx Initial Layer
Journal of Materials Science and Chemical Engineering, 2015
[11] Surface treatment of TiO2 nanoparticles via sol–gel method: Effect of silane type on hydrophobicity of the nanoparticles
Progress in Organic Coatings, 2015
[12] Low Pressure Chemical Vapor Deposition of TiO 2 Layer in Hydrogen-Ambient
Journal of Crystallization Process and Technology, 2014
[13] Low Pressure Chemical Vapor Deposition of TiO2 Layer in Hydrogen-Ambient
2014
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