<?xml version="1.0" encoding="UTF-8"?><!DOCTYPE article  PUBLIC "-//NLM//DTD Journal Publishing DTD v3.0 20080202//EN" "http://dtd.nlm.nih.gov/publishing/3.0/journalpublishing3.dtd"><article xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" dtd-version="3.0" xml:lang="en" article-type="research article"><front><journal-meta><journal-id journal-id-type="publisher-id">AMPC</journal-id><journal-title-group><journal-title>Advances in Materials Physics and Chemistry</journal-title></journal-title-group><issn pub-type="epub">2162-531X</issn><publisher><publisher-name>Scientific Research Publishing</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.4236/ampc.2017.71002</article-id><article-id pub-id-type="publisher-id">AMPC-73678</article-id><article-categories><subj-group subj-group-type="heading"><subject>Articles</subject></subj-group><subj-group subj-group-type="Discipline-v2"><subject>Chemistry&amp;Materials Science</subject><subject> Physics&amp;Mathematics</subject></subj-group></article-categories><title-group><article-title>
 
 
  Power Law Nature in Electron Solid Interaction
 
</article-title></title-group><contrib-group><contrib contrib-type="author" xlink:type="simple"><name name-style="western"><surname>Moirangthem</surname><given-names>Shubhakanta Singh</given-names></name><xref ref-type="aff" rid="aff1"><sup>1</sup></xref></contrib><contrib contrib-type="author" xlink:type="simple"><name name-style="western"><surname>R.</surname><given-names>K. Brojen Singh</given-names></name><xref ref-type="aff" rid="aff2"><sup>2</sup></xref></contrib></contrib-group><aff id="aff1"><addr-line>Department of Physics, Manipur University, Canchipur, India</addr-line></aff><aff id="aff2"><addr-line>School of Computational and Integrative Sciences, Jawaharlal Nehru University, New Delhi, India</addr-line></aff><pub-date pub-type="epub"><day>11</day><month>01</month><year>2017</year></pub-date><volume>07</volume><issue>01</issue><fpage>11</fpage><lpage>18</lpage><history><date date-type="received"><day>6,</day>	<month>December</month>	<year>2016</year></date><date date-type="rev-recd"><day>19,</day>	<month>January</month>	<year>2017</year>	</date><date date-type="accepted"><day>22,</day>	<month>January</month>	<year>2017</year></date></history><permissions><copyright-statement>&#169; Copyright  2014 by authors and Scientific Research Publishing Inc. </copyright-statement><copyright-year>2014</copyright-year><license><license-p>This work is licensed under the Creative Commons Attribution International License (CC BY). http://creativecommons.org/licenses/by/4.0/</license-p></license></permissions><abstract><p>
 
 
  Monte Carlo simulation of paths of a large number of impinging electrons in a multi-layered solid allows defining area of spreading electrons (A) to capture overall behavior of the solid. This parameter “A” follows power law with electron energy. Furthermore, change in critical energies, which are minimum energies loses corresponding to various electrons, as a function of variation in lateral distance also follows power law nature. This power law behavior could be an indicator of how strong self-organization a solid has which may be used in monitoring efficiency of device fabrication.
 
</p></abstract><kwd-group><kwd>Monte Carlo Simulations</kwd><kwd> Power Law</kwd><kwd> E-Beam Lithography</kwd><kwd> Electron Solid Interaction</kwd></kwd-group></article-meta></front><body><sec id="s1"><title>1. Introduction</title><p>The interaction of beam of energetic electrons with the target solid material technique, which is electron beam lithography, is of great interest in probing material properties (chemical, electrical, physical etc.) [<xref ref-type="bibr" rid="scirp.73678-ref1">1</xref>] at sub-micron and nanoscale level [<xref ref-type="bibr" rid="scirp.73678-ref2">2</xref>] , and has many applications, modeling radio-induced cellular damages [<xref ref-type="bibr" rid="scirp.73678-ref3">3</xref>] , in surface science technology [<xref ref-type="bibr" rid="scirp.73678-ref4">4</xref>] , nanolithography techniques [<xref ref-type="bibr" rid="scirp.73678-ref5">5</xref>] , fabrication of fractal surfaces [<xref ref-type="bibr" rid="scirp.73678-ref6">6</xref>] , various biological applications [<xref ref-type="bibr" rid="scirp.73678-ref7">7</xref>] etc. The impinging energetic electron suffers random collisions from a number of scattering centres with random distribution of potentials in the centres in the solid materials of various layers [<xref ref-type="bibr" rid="scirp.73678-ref3">3</xref>] , and the electron follows a stochastic path inside the solid material [<xref ref-type="bibr" rid="scirp.73678-ref1">1</xref>] . The analysis of the electron paths could highlight some of the important properties of the material which will be used in various device fabrications and various other applications.</p><p>One of the most important properties of real networks, ranging from social to biological protein-protein networks [<xref ref-type="bibr" rid="scirp.73678-ref8">8</xref>] , is power law nature of the network distribution [<xref ref-type="bibr" rid="scirp.73678-ref9">9</xref>] which could be a reflection of fractal nature of the system [<xref ref-type="bibr" rid="scirp.73678-ref10">10</xref>] . Since fractal behavior of the system can be used as an indicator of self-organization in the system [<xref ref-type="bibr" rid="scirp.73678-ref11">11</xref>] , one can use this property to identify important patterns and their origin in the system [<xref ref-type="bibr" rid="scirp.73678-ref12">12</xref>] [<xref ref-type="bibr" rid="scirp.73678-ref13">13</xref>] [<xref ref-type="bibr" rid="scirp.73678-ref14">14</xref>] . The path of the penetrating electrons in solid system is the reflection of organization of the regular scattering centres with random potential distributions; one can identify probable parameters to capture patterns of organization in the solid material. In this work, we try to search for possible parameters to characterize fractal nature of the solid systems using Monte carlo simulation procedure which could be used for various fabrication techniques. In Section 2, the detailed Monte Carlo procedure of electron- solid interaction is described. Simulation results are described in Section 3, and some conclusions are drawn based on the simulation results.</p></sec><sec id="s2"><title>2. Electron Solid Interaction Model</title><p>The path traversed by impinging energetic electrons in solid is based on the electron transport within the stochastic formalism of scattering process of electrons with the solid along their trajectory [<xref ref-type="bibr" rid="scirp.73678-ref3">3</xref>] [<xref ref-type="bibr" rid="scirp.73678-ref15">15</xref>] . The penetrating electrons encounter randomly distributed scattering centres within the electron interaction range [<xref ref-type="bibr" rid="scirp.73678-ref3">3</xref>] , and the electrons undergo complicated Brownian paths inside the solid [<xref ref-type="bibr" rid="scirp.73678-ref16">16</xref>] . These electrons with energy (E) move in straight lines between any two scattering centres, and once they suffer interaction with scattering centres of the solid, the change in their directions are defined by ( E , θ , ϕ ) , where, θ and ϕ are scattering and azimuthal angles respectively. The solid could be single or multi-layered thin film with different distributions of scattering centres in different solid layers.</p><p>We consider impinging electrons suffering elastic collisions from scattering centres distributed in the single or multi-layered thin solid film, where, differential cross section can be described by classical screened Rutherford’s formula [<xref ref-type="bibr" rid="scirp.73678-ref16">16</xref>] ,</p><p>d σ dΩ = e 4 Z ( Z + 1 ) 4 E [ 1 + cos ( θ ) + 2 β ] 2 (1)</p><p>where, e is electronic charge, Z is the atomic number of the material and d Ω is solid angle. β is screening parameter to account for electrostatic screening of the nucleus by the orbital electrons, and is given by Thomas-Fermi model of the atomic field [<xref ref-type="bibr" rid="scirp.73678-ref17">17</xref>] ,</p><p>β = 0.316 ( ℏ Z 1 / 3 p a 0 ) (2)</p><p>where, a 0 is Bohr radius; ℏ is Planck’s constant and p is the electron’s momentum. The scattering angle θ can be calculated by evaluating total elastic cross section σ = ∫ d Ω from Equation (1),</p><p>θ = cos − 1 ( 1 ) + [ 1 + 2 β F ( θ ) 1 + β − F ( θ ) ] (3)</p><p>where, F ( θ ) is accumulated function of scattering probability [<xref ref-type="bibr" rid="scirp.73678-ref18">18</xref>] which is a function of theta only. In the Monte Carlo simulation procedure, θ can be obtained by generating a uniform random number R<sub>1</sub> in [0, 1], and azimuthal angle ϕ by generating another uniform random number R2 and using,</p><p>ϕ = 2 π R 2 (4)</p><p>Thus, θ and ϕ can be calculated by generating two sets of uniform random numbers, and using Equation (3) and (4).</p><sec id="s2_1"><title>2.1. Energy Loss Calculation of Traversing Electron</title><p>The energy of the electron, suffering interaction from the scattering centres distributed randomly along its path, continuously loses its kinetic energy and can be calculated using Bethe’s continuous slowing down approximation model [<xref ref-type="bibr" rid="scirp.73678-ref19">19</xref>] . This model is a good empirical method for high energetic electrons as compared to ionization energy J i.e. for E ≫ J , but suffers problem for E ≤ J [<xref ref-type="bibr" rid="scirp.73678-ref20">20</xref>] . However, the model was generalized for all range of energies [<xref ref-type="bibr" rid="scirp.73678-ref21">21</xref>] , where, the energy loss Δ E of the penetrating electron a path length L along its trajectory is given by,</p><p>Δ E = − ∫ 0 L d z ( d E d z ) (5)</p><p>d E d z = − 2 π e 4 ( ρ N A M E ) ln ( 1.166 E ∈ ) and ∈ J 1 + C (JC)</p><p>where, M is the atomic weight of the target material; ρ is the density; N<sub>A</sub> is the Avogadro’s number and C is a constant (C&#174;1; C &lt; 1). The mean ionization energy J can be obtained from the empirical formula [<xref ref-type="bibr" rid="scirp.73678-ref22">22</xref>] ,</p><p>J Z = 9.76 + 58.8 Z − 1.19 (6)</p><p>where . J Z → 9.76 as Z → ∞ . Further, the sensitivity of the J in Monte Carlo simulation can be controlled by taking logarithm of this parameter.</p></sec><sec id="s2_2"><title>2.2. Modeling Electron Path in Multi-Layered System</title><p>The mean free path for single layered system, calculated using Equation (1), can be extended for multi-layered system by defining a probability P<sub>m</sub>(u) that the electron once scattered from first layer is not scattered until mth layer [<xref ref-type="bibr" rid="scirp.73678-ref23">23</xref>] [<xref ref-type="bibr" rid="scirp.73678-ref24">24</xref>] , and can be obtained from the following Equation,</p><p>d P m ( u ) d u = − Γ m P m ( u ) (7)</p><p>where, Γ m is scattering probability per unit length in mth layer. Boundary condition is taken as P 1 ( 0 ) = 1 . Solving Equation (7) one can arrive at P m + 1 ( u − u m ) = P m ( u ) , where, u<sub>m</sub> is the distance between mth and (m + 1) th layers along z-axis. This P m ( u ) can be related to F ( u ) by,</p><p>F ( u ) = 1 − P m ( u ) = 1 − R 1 , and θ can be solved using Equation (3). The mean</p><p>free path for single layer system is calculated as λ 1 = ∫ 0 ∞ u P 1 ( u ) d u = − 1 / Γ 1 , where,</p><p>P 1 ( u ) = exp ( − u Γ 1 ) . Similarly, mean free path for two layered system is given</p><p>by, λ 2 = ∫ 0 u u ′ P 1 ( u ′ ) d u ′ + ∫ u ∞ u ′ P 1 ( u ′ ) d u ′ = 1 / Γ + ( 1 / Γ 2 − 1 / Γ 1 ) exp ( u Γ 1 ) . Proceeding</p><p>in the same way, mean free path for m layered system can be calculated using,</p><p>λ m = ∫ 0 u 1 u ′ P 1 ( u ′ ) d u ′ + ∫ u 1 u 2 ∞ u ′ P 1 ( u ′ ) d u ′ + ⋯ + ∫ u 1 ∞ u ′ P 1 ( u ′ ) d u ′ (8)</p><p>From Equation (8) one can able to calculate u<sub>m</sub> of impinging electron in mth layered material system. Now, starting from an initial vector ( x 0 , y 0 , z 0 ) T , we can trace the path of the penetrating electron in m-layered system using the following recursive procedure,</p><p>( x n + 1 y n + 1 z n + 1 ) = ( x n y n z n ) + ( sin θ n cos ϕ n sin θ n sin ϕ n cos θ n ) (9)</p><p>Thus the path of the penetrating electron in m-layered material system can be traced using the recursive procedure in (9) with average energy loss Δ E within the Monte Carlo simulation.</p></sec></sec><sec id="s3"><title>3. Results and Discussion</title><p>We consider single layered GaP and double layered system of GaP with resist PMMA (C<sub>5</sub>H<sub>8</sub>O<sub>2</sub>), and simulated using the Monte Carlo simulation procedure described in the previous section to trace the trajectory of impinging energetic electrons in the systems and energy loss. The initial positions of the penetrating 500 electrons are taken as the same as ( x 0 , y 0 , z 0 ) T = ( 0 , 0 , 0 ) T for a range of energy [2 - 100] keV. The trajectory of each electron of energy E is calculated using Monte Carlo procedure (9), and energy loss ( Δ E ) during the process of penetration is obtained using Equation (5). In our simulation the ionization energies of C, H and O are taken to be 78 eV, 18.7 eV and 89 eV, and for GaP, Equation (6) is used to calculate its J. Since the ionization energy of both GaP and PMMA are of the order of eV, E ≫ J in our case and therefore, we take C &lt; 1 in Equation (5) during the calculation. The thickness of the PMMA resist is taken to be 10<sup>−</sup><sup>8</sup> metre in the double layered calculation.</p><sec id="s3_1"><title>3.1. Power Law Nature of Electron Spreading Area</title><p>The paths of the impinging electrons (500 electrons’ paths) in single layer GaP system with different energies ([2 - 100] keV) are calculated (<xref ref-type="fig" rid="fig1">Figure 1</xref> left panels) and two dimensional areas of the spreading electrons (circles in the figures) for different energies are obtained. The area of each circle is calculated for ten ensembles, and average of minimum and maximum areas bounded to the two dimensional electron spreading area of 500 electron trajectories (error bars in the plot in middle lower panel of <xref ref-type="fig" rid="fig1">Figure 1</xref>). This calculated areas A as a function of E is found to follow the following power law behaviour,</p><p>A ( E ) ~ E g (10)</p><p>The straight line is the fitting curve to the calculated data. The value of γ is found to be 1.98.</p><p>We then calculated the As in double layered material system (1 mm thickness for PMMA and rest for GaP) for various electron energies [2 - 100] keV (<xref ref-type="fig" rid="fig2">Figure 2</xref> left panels). The behavior of A with respect to E (<xref ref-type="fig" rid="fig2">Figure 2</xref> middle upper panel) has three regimes, left (electrons paths are within single first layer only) and right (dominated by second layer as compared to first layer) regimes follow similar power law given by Equation (10), and the values of γ are found to be 2.1 and 1.97 respectively. The middle regime, which is due to contributions from both first and second layers, does not follow exact power law nature.</p></sec><sec id="s3_2"><title>3.2. Power Law Behaviour in Energy Loss</title><p>The energy loss of impinging 15000 electrons in single layer systems is calculated as a function of lateral distance R of the electron trajectories for different energies (<xref ref-type="fig" rid="fig1">Figure 1</xref> right panels). The values of E sharply drop after a certain value of R for different values of E showing that the electrons do not have sufficient energies to penetrate further in the solid. We then calculated these critical</p><p>E<sub>c</sub> and R<sub>c</sub> for different Es in the range [10 - 100] keV. Then we calculated possible changes in these critical energies ( Δ E ) as a function of Δ R starting from lowest (E<sub>c</sub>, R<sub>c</sub>), and error bars are standard deviations of the thicknesses of the drop curves (lines drawn parallel to E axis in <xref ref-type="fig" rid="fig1">Figure 1</xref> right panels). The calculated Δ E again follows power law with Δ R as follows,</p><p>Δ E ∼ Δ R d (11)</p><p>The power law fit to the data gives the power law exponent to be δ = 2.21 .</p><p>We now calculated Δ E in double layered material system as a function of Δ R for energies [10 - 100] keV (<xref ref-type="fig" rid="fig2">Figure 2</xref> left lower panels). Surprisingly, even though there is contributions from first and second layers, the behavior of Δ E as a function of Δ R follows the similar power law nature as Equation (11) with the value of δ = 2.17 .</p></sec></sec><sec id="s4"><title>4. Conclusion</title><p>The path and spread of the trajectory of any energetic electron is proportional to the energy it possesses and material in which the electron is penetrating. Even though the impinging electrons trajectories are stochastic zig-zag nature, the overall behavior of the large number of electrons exhibits the nature of the material’s characteristics. The area of the impinging electrons in single layered system follows power law as a function of electrons’ energy.</p><p>The power law behavior is found to various systems, starting from social systems to brain protein-protein networks which indicate important functional and organizational characteristics. This behavior indicates that the properties of the system are independent of scale of the system. Since this law also reflects the fractal nature of the system, it characterizes as an indicator of self-organized behavior of the material system. The impinging energetic electrons experience the self-organized behavior of the system which is reflected in the parameters calculated using Monte Carlo simulation procedure. This idea of fractal nature could be used as an order parameter in the fabrication of multi-layered device with proper efficiency.</p></sec><sec id="s5"><title>Acknowledgement</title><p>We gratefully acknowledge the financial assistance provided by DST-PURSE, India for this work.</p></sec><sec id="s6"><title>Cite this paper</title><p>Singh, M.S. and Singh, R.K.B. (2017) Power Law Nature in Electron Solid Interaction. Advances in Materials Physics and Chemistry, 7, 11-18. http://dx.doi.org/10.4236/ampc.2017.71002</p></sec></body><back><ref-list><title>References</title><ref id="scirp.73678-ref1"><label>1</label><mixed-citation publication-type="other" xlink:type="simple">Kyser, D.F. and Viswanathan, N.S. (1975) Monte Carlo Simulation of Spatially Distributed Beams in Electron-Beam Lithography. Journal of Vacuum Science and Technology, 12, 1305-1308. https://doi.org/10.1116/1.568524</mixed-citation></ref><ref id="scirp.73678-ref2"><label>2</label><mixed-citation publication-type="book" xlink:type="simple">Zhou, Z. (2004) Electron Beam Lithography. In: Yao, N., Ed., Handbook of Microscopy for Nanotechnology, Kluwer/Springer.</mixed-citation></ref><ref id="scirp.73678-ref3"><label>3</label><mixed-citation publication-type="other" xlink:type="simple">Shimizu, R. and Ding, Z.J. (1992) Monte Carlo Modelling of Electron-Solid Interactions. Reports on Progress in Physics, 55, 487-531.  
https://doi.org/10.1088/0034-4885/55/4/002</mixed-citation></ref><ref id="scirp.73678-ref4"><label>4</label><mixed-citation publication-type="other" xlink:type="simple">Niedrig, H. (1982) Erratum: Electron Backscattering from Thin Films [Journal of Applied Physics, 50, R15 (1982)]. Journal of Applied Physics, 53, 815.  
https://doi.org/10.1063/1.331653</mixed-citation></ref><ref id="scirp.73678-ref5"><label>5</label><mixed-citation publication-type="other" xlink:type="simple">Grigorescu, A.E. and Hagen, C.W. (2009) Resists for Sub-20-nm Electron Beam Lithography with a Focus on HSQ: State of the Art. Nanotechnology, 20, Article ID: 292001. https://doi.org/10.1088/0957-4484/20/29/292001</mixed-citation></ref><ref id="scirp.73678-ref6"><label>6</label><mixed-citation publication-type="other" xlink:type="simple">Stoliar, P., Calo, A., Valle, F. and Biscarini, F. (2010) Fabrication of Fractal Surfaces by Electron Beam Lithography. IEEE Transactions on Nanotechnology, 9, 229-236.  
https://doi.org/10.1109/TNANO.2009.2027232</mixed-citation></ref><ref id="scirp.73678-ref7"><label>7</label><mixed-citation publication-type="other" xlink:type="simple">Etin, A. and Ko, K. (2015) NeuroQuantology, 2, 160-169.</mixed-citation></ref><ref id="scirp.73678-ref8"><label>8</label><mixed-citation publication-type="other" xlink:type="simple">Albert, R. and Barabasi, A. (2002) Statistical Mechanics of Complex Networks. Reviews of Modern Physics, 74, 47. https://doi.org/10.1103/RevModPhys.74.47</mixed-citation></ref><ref id="scirp.73678-ref9"><label>9</label><mixed-citation publication-type="other" xlink:type="simple">Albert, R. and Barabasi, A. (1999) Emergence of Scaling in Random Networks. Science, 286, 509-512. https://doi.org/10.1126/science.286.5439.509</mixed-citation></ref><ref id="scirp.73678-ref10"><label>10</label><mixed-citation publication-type="other" xlink:type="simple">Jung, S., Kim, S. and Kahng, B. (2002) Geometric Fractal Growth Model for Scale-Free Networks. Physical Review E, 65, Article ID: 056101.  
https://doi.org/10.1103/PhysRevE.65.056101</mixed-citation></ref><ref id="scirp.73678-ref11"><label>11</label><mixed-citation publication-type="other" xlink:type="simple">Kauffman, S.A. (1993) The Origins of Order: Self-Organization and Selection in Evolution. Oxford University Press, Oxford.</mixed-citation></ref><ref id="scirp.73678-ref12"><label>12</label><mixed-citation publication-type="other" xlink:type="simple">Mandelbrot, B.B. (1983) The Fractal Geometry of Nature. WH Freeman and Co., New York.</mixed-citation></ref><ref id="scirp.73678-ref13"><label>13</label><mixed-citation publication-type="other" xlink:type="simple">Peitgen, H.-O., Jurgens, H. and Saupe, D. (1992) Chaos and Fractals: New Frontiers of Science. Springer, New York. https://doi.org/10.1007/978-1-4757-4740-9</mixed-citation></ref><ref id="scirp.73678-ref14"><label>14</label><mixed-citation publication-type="other" xlink:type="simple">Theiler, J. (1990) Estimating Fractal Dimension. Journal of the Optical Society of America A, 7, 1055-1073. https://doi.org/10.1364/JOSAA.7.001055</mixed-citation></ref><ref id="scirp.73678-ref15"><label>15</label><mixed-citation publication-type="other" xlink:type="simple">Singh, M.S., Singh, R.K.B., Khatri, R. and Sharma, B.I. (2010) Synthesis and Photoluminescence Properties of Hierarchical Zinc Germanate Nanostructures. Advanced Science Letters, 3, 1-5. https://doi.org/10.1166/asl.2010.1080</mixed-citation></ref><ref id="scirp.73678-ref16"><label>16</label><mixed-citation publication-type="other" xlink:type="simple">Murata, K. and Kyser, D.F. (1987) Monte Carlo Methods and Microlithography Simulation for Electron and X-Ray Beams. Advances Electronics and Electron Physics, 69, 175-259. https://doi.org/10.1016/S0065-2539(08)60202-4</mixed-citation></ref><ref id="scirp.73678-ref17"><label>17</label><mixed-citation publication-type="other" xlink:type="simple">Nigam, B.P., Sunderesan, M.K. and Ta-Yu, W. (1954) Theory of Multiple Scattering: Second Born Approximation and Corrections to Molière’s Work. Physical Review, 115, 491-502. https://doi.org/10.1103/PhysRev.115.491</mixed-citation></ref><ref id="scirp.73678-ref18"><label>18</label><mixed-citation publication-type="other" xlink:type="simple">Tokesi, K. and Mukoyama, T. (1994) Bulletin of the Institute for Chemical Research, 72, 3-4.</mixed-citation></ref><ref id="scirp.73678-ref19"><label>19</label><mixed-citation publication-type="book" xlink:type="simple">Bethe, H.A. (1933) Quantenmechanik der Einund Zwei-Elektronenprobleme. In: Bethe, H.A., et al., Eds., Quantentheorie, Vol. 24, Springer, Berlin, 273-560.  
https://doi.org/10.1007/978-3-642-52619-0_3</mixed-citation></ref><ref id="scirp.73678-ref20"><label>20</label><mixed-citation publication-type="other" xlink:type="simple">Rao-Sahib, T.S. and Wittry, D.B. (1974) X-Ray Continuum from Thick Elemental Targets for 10-50-keV Electrons. Journal of Applied Physics, 45, 5060-5068.  
https://doi.org/10.1063/1.1663184</mixed-citation></ref><ref id="scirp.73678-ref21"><label>21</label><mixed-citation publication-type="other" xlink:type="simple">Joy, D.C. and Luo, S. (1989) An Empirical Stopping Power Relationship for Low-Energy Electrons. Scanning, 11, 176-180.  
https://doi.org/10.1002/sca.4950110404</mixed-citation></ref><ref id="scirp.73678-ref22"><label>22</label><mixed-citation publication-type="other" xlink:type="simple">Berger, M.J. and Setzer, S.M. (1964) Studies in Penetration of Charged Particles in Matter. National Academy of Sciences, Washington DC, Chap. 10, 1133.</mixed-citation></ref><ref id="scirp.73678-ref23"><label>23</label><mixed-citation publication-type="other" xlink:type="simple">Horiguchi, S., Suzuki, M., Kobayashhi, T., Yoshino, H., and Sakakibara, Y. (1981) New Model of Electron Free Path in Multiple Layers for Monte Carlo Simulation. Applied Physics Letters, 39, 512-514. https://doi.org/10.1063/1.92785</mixed-citation></ref><ref id="scirp.73678-ref24"><label>24</label><mixed-citation publication-type="other" xlink:type="simple">Hawryluk, R.J., Hawryluk, A.M. and Smith, H.I. (1982) Addendum: New Model of Electron Free Path in Multiple Layers for Monte Carlo Simulation. Journal of Applied Physics, 53, 5985. https://doi.org/10.1063/1.331408</mixed-citation></ref></ref-list></back></article>