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W. G. Lee, S. I. Woo, J. C. Kim, S. H. Choi and K. H. Oh, “Preparation and Properties of Amorphous TiO2 Thin Films by Plasma Enhanced Chemical Vapor Deposition,” Thin Solid Films, Vol. 237, No. 1-2, 1994, pp. 105-111. doi:10.1016/0040-6090(94)90245-3

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