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Alers, G.B., Werder, D.J., Chabal, Y., Lu, H.C., Gusev, E.P., Garfunkel, E., Gustafsson, T. and Urdahl, R.S. (1998) Intermixing at the Tantalum Oxide/Silicon Interface in Gate Dielectric Structures. Applied Physics Letters, 73, 1517.
http://dx.doi.org/10.1063/1.122191

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