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Flachbart, K., Pavlík, V., Tomasovicová, N., Adkins, C.J., Somora, M., Leib, J. and Eska, G. (1998) Conduction Mechanism in RuO2-Based Thick Films. Physica Status Solidi (b), 205, 399-404.
http://dx.doi.org/10.1002/(SICI)1521-3951(199801)205:1<399::AID-PSSB399>3.0.CO;2-X

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