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B. M. Radjenovic, M. D. Radmilovic-Radjenovic and Z. L. Petrovic, “Dynamics of the Profile Charging During SiO2 Etching in Plasma for High Aspect Ratio Trenches,” IEEE Transactions on Plasma Science, Vol. 36, No. 4, 2008, pp. 874-875.
http://dx.doi.org/10.1109/TPS.2008.920886

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