TITLE:
Model for a UV Laser Based Local Polymer Surface Halogenation Process Using a Gaseous Precursor
AUTHORS:
Simon Kibben
KEYWORDS:
Local Surface Halogenation; Polymer Modification; UV-Laser-Based Surface Modification
JOURNAL NAME:
Modeling and Numerical Simulation of Material Science,
Vol.4 No.1,
January
7,
2014
ABSTRACT: An analytical model describing the physical relations of a UV-based process for halogenation of polymeric surfaces is presented. The process allows, depending on the parameters, a local halogenation with sharp edges at the interfaces to areas where no halogenation is desired. This is achieved via a nonreactive halogen-containing gaseous precursor and a UV source providing photons which dissociate the precursor photolytically. Thus, only where the UV photons affect the precursor, halogens are generated and the polymer is being halogenated.