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C. Liu, G. Q. Li, W. X. Chen, Z. X. Mu, C. W. Zhang and L. Wang, “The Study of Doped DLC Films by Ti Ion Implantation,” Thin Solid Films, Vol. 475, No. 1-2, 2005, pp. 279-282. doi:10.1016/j.tsf.2004.08.051

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