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Srivastava, A., Nahar, R. and Sarkar, C. (2010) Study of the Effect of Thermal Annealing on High k Hafnium Oxide Thin Film Structure and Electrical Properties of MOS and MIM Devices. Journal of Materials Science: Materials in Electronics, 22, 882-889.
http://dx.doi.org/10.1007/s10854-010-0230-8

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