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Yang, D.H. (2006) On the Technological Parameters Deposition of Al Thin Films by DC Magnetron Sputtering. Journal of Chongqing Institute of Technology, 20, 69-71.

has been cited by the following article:

  • TITLE: Magnetron Sputtering Coating of Protective Fabric Study on Influence of Thermal Properties

    AUTHORS: Yunqi Zhai, Xiaoxia Liu, Li Xiao

    KEYWORDS: Magntron Sputtering, Heat Reflectance, Nano-Film

    JOURNAL NAME: Journal of Textile Science and Technology, Vol.1 No.3, November 30, 2015

    ABSTRACT: Protective fabric has been the focus of research of the textile materials. In recent years, with the rapid development of the robot, its protective fabric has been developed quickly. This paper is making Al, SiO2 as the sputtering target materials, magnetron sputtering as technology, on the back of the fabric sputtering Al layer, double-layer Al/SiO2 film, and three-layer SiO2/Al/SiO2 film through the test of the heat reflectivity of the composite materials. As a result, the highest reflectivity of the SiO2/Al/SiO2, SiO2/Al, and single Al film is 64.97%, 57.38%, and 51.59%, respectively. It is clear that reflectivity increases with the increase of the membrane layer. In three kinds of membrane structures, there are nanometer Al particles in the formation of dense membrane structure, which can improve the reflectivity of the fabric.