TITLE:
Enhanced Photo-Induced Property of LPCVD-TiO2 Layer on PCVD-TiOx Initial Layer
AUTHORS:
Satoshi Yamauchi, Keisuke Yamamoto, Sakura Hatakeyama
KEYWORDS:
LPCVD Anatase-TiO2, PCVD TiOx, Hydrophilicity, Photocatalyst
JOURNAL NAME:
Journal of Materials Science and Chemical Engineering,
Vol.3 No.7,
June
18,
2015
ABSTRACT: Plasma-assisted chemical vapor deposition (PCVD) was applied for amorphous TiOx deposition on
Pyrex-glass substrate at low temperature below 90°C to control orientation of anatase-TiO2 layer
by low pressure chemical vapor deposition (LPCVD) using TTIP-single precursor. Preferentially
-oriented anatase-TiO2 layer was successfully deposited with the orientation ratio as high as
68% on the initial layer of the thickness around 70 nm. Contact angle water was quickly decreased
by UV-irradiation on the highly -oriented TiO2 layer comparing with the layer directly deposited
on glass, whereas surface roughness on the former was significantly reduced in comparison
to that on the latter. Methyleneblue (MB) aqueous solution with the concentration of 2 mmol/L
was used to evaluate photocatalytic property on the layer. Rate constant of MB-decomposition via
first order kinetics increased with the orientation ratio above 60% was resulted in 2.3 × 10-1min-1 for the layer with -orientation ratio of 68%, whereas the constant was 2.8 × 10-3 min-1 for the layer directly deposited on glass.