TITLE:
Influence of Thickness on the Photosensing Properties of Chemically Synthesized Copper Sulfide Thin Films
AUTHORS:
Abhiman Dattatray Dhondge, Sunil Rameshgir Gosavi, Narayani Madhukar Gosavi, Chatur Pundlik Sawant, Amar Maruti Patil, Abhijeet Ravsaheb Shelke, Nishad Gopal Deshpande
KEYWORDS:
Copper Sulfide (CuS), Chemical Bath Deposition (CBD), Thin Film, X-Ray Diffraction (XRD), Field Emission Scanning Electron Microscopy (FESEM), Photosensitivity
JOURNAL NAME:
World Journal of Condensed Matter Physics,
Vol.5 No.1,
January
21,
2015
ABSTRACT: We report
here the influence of thickness on the photosensing properties of copper sulfide
(CuS) thin films. The CuS films were deposited onto glass substrate by using a
simple and cost effective chemical bath deposition method. The changes in film
thickness as a function of time were monitored. The films were characterized
using X-ray diffraction technique (XRD), field emission scanning electron
microscopy (FE-SEM), optical measurement techniques and electrical measurement.
X-ray diffraction results indicate that all the CuS thin films have an
orthorhombic (covellite) structure with preferential orientation along (113)
direction. The intensity of the diffraction peaks increases as thickness of the
film increases. Uniform deposition having nanocrystalline granular morphology
distributed over the entire glass substrate was observed through FE-SEM
studies. The crystalline and surface properties of the CuS thin films improved
with increase in the film thickness. Transmittance (except for 210 nm thick CuS
film) together with band gap values was found to decrease with increase in
thickness. I-V measurements under dark and illumination condition show that the
CuS thin films give a good photoresponse.