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Zhang, L., Jiang, H.C., Liu, C., Dong, J.W. and Chow, P. (2007) Annealing of Al2O3 Thin Films Prepared by Atomic Layer Deposition. Journal of Physics D: Applied Physics, 40, 3707-3713.
http://dx.doi.org/10.1088/0022-3727/40/12/025

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